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Wednesday, August 27, 2008
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ECE 598-KJ
Micro/Nanolithography:
Science, Technology, and Applications
| Course Director:
| Kanti Jain
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| Description:
| This course provides a comprehensive foundation in the
broad field of micro/nanolithography for graduate students in varied
research areas. Lithography is the central process technology used in
fabrication of a vast array of micro/nano structures required in microelectronic
devices, displays, flexible electronics, microelectromechanical systems,
and biotechnology. The course covers the science of microlithography,
including optical imaging, photochemistry, and materials issues; the
extensive technological developments, including state-of-the-art commercial
lithography systems; and the innumerable applications of lithography
in diverse fields. |
| Notes:
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Course Materials: Chapters from several books, numerous journal
articles, proceedings of conferences, and industry reports |
| Credit:
| 4 hours |
| Topics:
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- Evolution of microelectronic devices; critical role
of lithography.
- Fundamental elements and attributes of microlithographic processes.
- Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
- Excimer lasers as dominant sources for lithography. Key features.
- Optical projection lithography. Primary concepts. Steppers and scanners.
- Lithography on flexible substrates. Roll-to-roll lithography.
- Photoresists. Main constituents and functions. Performance parameters.
- Resolution enhancement techniques. Phase shift masks. Immersion lithography.
- Maskless lithography. Spatial light modulators. Biotechnology applications.
- Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
- X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
- Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
- Nanoimprint lithography. Basic concepts. Limitations. Applications.
- UV laser photoablation. Photochemistry. Ablation systems. Key applications.
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| Course Prerequisites:
| ECE 444 or 460, or Physics 402, or MSE 462, or ME 498,
or Consent of Instructor |
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